Formation of titanium oxide thin films by reactive magnetron sputtering
نویسندگان
چکیده
منابع مشابه
AlNXOY THIN FILMS DEPOSITED BY DC REACTIVE MAGNETRON SPUTTERING
AlNxOy thin films were produced by DC reactive magnetron sputtering, using an atmosphere of argon and a reactive gas mixture of nitrogen and oxygen, for a wide range of partial pressures of reactive gas. During the deposition, the discharge current was kept constant and the discharge parameters were monitored. The deposition rate, chemical composition, morphology, structure and electrical resis...
متن کاملNanocharacterization of titanium nitride thin films obtained by reactive magnetron sputtering
Titanium nitride thin films are used in applications such as tribological layers for cutting tools, coating of some medical devices (scalpel blades, prosthesis, implants etc.), sensors, electrodes for bioelectronics, microelectronics, diffusion barrier, bio-microelectromechanical systems (Bio-MEMS) and so on. This work is a comparative study concerning the influence of substrate temperature on ...
متن کاملElectrical resistivity of copper oxide thin films prepared by reactive magnetron sputtering
Purpose: Investigation the effect of varying r.f. power and oxygen flow rates during deposition on the electrical properties of copper oxide thin films prepared by reactive magnetron sputtering Design/methodology/approach: The films were characterised by AFM, XPS, four point electrical resistivity probe measurements and spectrophotometry. Findings: The electrical sheet resistance of the films w...
متن کاملMechanical Properties and Microstructural Evolution of Ta/TaNx Double Layer Thin Films Deposited by Magnetron Sputtering
Crystalline tantalum thin films of about 500nm thickness were deposited on AISI 316L stainless steel substrate using magnetron sputtering. To investigate the nano-mechanical properties of tantalum films, deposition was performed at two temperatures (25°C and 200°C) on TaNx intermediate layer with different N2/Ar flow rate ratio from 0 to 30%. Nano-indentation was performed to obtain the mechani...
متن کاملDEPOSITION OF THIN TiO2 FILMS BY DC MAGNETRON SPUTTERING METHOD
Sputter deposition process is another old technique being used in modern semiconductor industries. Sputtering is a process that can deposit TiO2 material on wafer/glass substrates. In this process target is connected to negative high voltage. Further argon gas is introduced into the chamber and is ionized to a positive charge. The positively charged argon atoms are attracted and strike the nega...
متن کاملذخیره در منابع من
با ذخیره ی این منبع در منابع من، دسترسی به آن را برای استفاده های بعدی آسان تر کنید
ژورنال
عنوان ژورنال: Doklady BGUIR
سال: 2019
ISSN: 1729-7648
DOI: 10.35596/1729-7648-2019-123-5-87-93